The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 2023

Filed:

Dec. 23, 2020
Applicants:

Osaka University, Suita, JP;

Daikin Industries, Ltd., Osaka, JP;

Inventors:

Akihiro Oshima, Suita, JP;

Yoshikage Ohmukai, Osaka, JP;

Yuko Shiotani, Osaka, JP;

Kazuyuki Satou, Osaka, JP;

Michio Matsuda, Osaka, JP;

Tomohiro Yoshida, Osaka, JP;

Ikuo Yamamoto, Osaka, JP;

Assignees:

OSAKA UNIVERSITY, Osaka, JP;

DAIKIN INDUSTRIES, LTD., Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D21H 19/20 (2006.01); D21H 21/16 (2006.01); D21H 27/10 (2006.01);
U.S. Cl.
CPC ...
D21H 19/20 (2013.01); D21H 21/16 (2013.01); D21H 27/10 (2013.01);
Abstract

A method for producing a paper, which includes applying at least one of ionizing radiation and plasma to at least one of a paper base and a compound (A) selected from: a compound having a carbon-carbon unsaturated bond and containing no fluorine atom in a molecular structure, and a compound containing no fluorine atom in a molecular structure in which radicals are generated by irradiation of an electron beam to the compound, to introduce a layer formed from the compound (A) on a surface of the paper base.


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