The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 2023

Filed:

Nov. 19, 2021
Applicant:

Gojo Industries, Inc., Akron, OH (US);

Inventors:

Amanda Jo Copeland, Seville, OH (US);

Venkatesan Padyachi, Kendall Park, NJ (US);

James Bingham, Akron, OH (US);

Nick Ciavarella, Seven Hills, OH (US);

Kayla Elise Ivey, Cuyahoga Falls, OH (US);

Carey Jaros, Shaker Heights, OH (US);

Daniel Willis, Clinton, OH (US);

Jessica Rae Tittl, Akron, OH (US);

Srini Venkatesh, Hudson, OH (US);

Assignee:

GOJO Industries, Inc., Akron, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K 8/34 (2006.01); A61K 8/46 (2006.01); C11D 1/88 (2006.01); C11D 1/90 (2006.01); C11D 1/92 (2006.01); C11D 3/48 (2006.01); A61Q 19/10 (2006.01); B08B 3/04 (2006.01); A61K 8/04 (2006.01); A61Q 17/00 (2006.01); A61K 8/44 (2006.01); A61K 8/365 (2006.01);
U.S. Cl.
CPC ...
A61K 8/34 (2013.01); A61K 8/046 (2013.01); A61K 8/345 (2013.01); A61K 8/365 (2013.01); A61K 8/44 (2013.01); A61K 8/442 (2013.01); A61K 8/463 (2013.01); A61Q 17/005 (2013.01); A61Q 19/10 (2013.01); A61K 2800/30 (2013.01); A61K 2800/34 (2013.01); A61K 2800/48 (2013.01); A61K 2800/596 (2013.01); A61K 2800/75 (2013.01); A61K 2800/805 (2013.01);
Abstract

A non-antimicrobial cleansing composition is disclosed comprising from about 10.0 wt. % to less than about 40 wt. % of one or more C-Calcohols; about 0.5 wt. % to about 10.0 wt. % of at least one primary surfactant; 0 wt. % to about 10.0 wt. % of at least one secondary surfactant, with the primary and secondary surfactants having an HLB value greater than 8; a pH adjusting agent; and water. The composition does not achieve a microbial kill level greater than 2.0 log.


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