The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 18, 2023

Filed:

Jun. 23, 2021
Applicant:

Coventor, Inc., Cary, NC (US);

Inventors:

Kenneth B. Greiner, Arlington, MA (US);

Stephen R. Breit, Wayland, MA (US);

David M. Fried, Monte Sereno, CA (US);

Daniel Faken, Peabody, MA (US);

Assignee:

Coventor, Inc., Cary, NC (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/39 (2020.01); G06F 119/12 (2020.01);
U.S. Cl.
CPC ...
G06F 30/39 (2020.01); G06F 2119/12 (2020.01);
Abstract

A virtual fabrication environment for semiconductor device structures that includes the use of virtual metrology measurement data to optimize a virtual fabrication sequence is described. Further, calibration of the virtual fabrication environment is performed by comparing virtual metrology measurement data from a virtual fabrication run with a subset of measurements performed in a physical fabrication environment. Additionally, virtual experiments conducted in the virtual fabrication environment of the present invention generate multiple device structure models using ranges of process and design parameter variations for an integrated process flow and design space of interest.


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