The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2023
Filed:
Feb. 16, 2021
Aspentech Corporation, Bedford, MA (US);
Victoria Gras Andreu, Cambridge, MA (US);
Sven Serneels, Waltham, MA (US);
AspenTech Corporation, Bedford, MA (US);
Abstract
Computer implemented methods and systems generate an improved predicted model of an industrial process or process engineering system. The model is a function of measurable features of the subject process and selected first principle features. First principle features are selected that capture linearities in a residual of a linear model constructed using a received dataset of the subject process. The model can further be a function of a scaled spline. The scaled spline is generated by computing a spine for a measurable feature of the subject process, fitting the computer spline to the residual of the constructed linear model, and scaling the fitting spline with a scaling factor. The model results in improved predictions of behavior of the subject process by relying primarily on the data of the measurable features of the subject process.