The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 18, 2023

Filed:

Jan. 20, 2017
Applicant:

AZ Electronic Materials (Luxembourg) S.a.r.l., Luxembourg, LU;

Inventors:

Motoki Misumi, Otsu, JP;

Daishi Yokoyama, Kakegawa, JP;

Katsuto Taniguchi, Kakegawa, JP;

Masahiro Kuzawa, Nagoya, JP;

Assignee:

MERCK PATENT GMBH, Darmstadt, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/075 (2006.01); G03F 7/30 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0758 (2013.01); G03F 7/0045 (2013.01); G03F 7/0382 (2013.01); G03F 7/0757 (2013.01); G03F 7/30 (2013.01); G03F 7/40 (2013.01);
Abstract

To provide a negative type photosensitive composition curable at a low temperature and capable of forming a cured film excellent in transparency, in chemical resistance and in environmental durability, and also to provide a pattern-formation method employing the composition. [Means] The present invention provides a negative type photosensitive composition comprising: an alkali-soluble resin, a compound having two or more (meth)acryloyloxy groups, a polysiloxane, a polymerization initiator, and a solvent. The alkali-soluble resin is a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit.


Find Patent Forward Citations

Loading…