The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 18, 2023

Filed:

Jul. 17, 2019
Applicant:

Agc Inc., Chiyoda-ku, JP;

Inventors:

Keisuke Takagi, Chiyoda-ku, JP;

Tomoaki Sakurada, Chiyoda-ku, JP;

Assignee:

AGC Inc., Chiyoda-ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 267/06 (2006.01); C08F 220/68 (2006.01); C08F 220/28 (2006.01); C08F 265/04 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); C08F 220/281 (2020.02); C08F 220/68 (2013.01); C08F 265/04 (2013.01); C08F 267/06 (2013.01);
Abstract

To provide a curable composition for imprinting whereby a cured product layer for a replica mold, which is excellent in the adhesion to a mold substrate and the release property from a cured product of a transfer object material when used in an imprinting method is formed; a replica mold for imprinting, using the curable composition for imprinting; its production process and a process for producing an article having a fine pattern on its surface by using the replica mold. A curable composition for imprinting, which comprises a fluorinated polymer comprising structural units (a) based on CH═C(R)C(O)ORR(R: a hydrogen atom, a methyl group or the like, R: a bivalent linking group having no fluorine atom and R: a Cfluoroalkyl group or the like) and structural units (b) having a cationic polymerizable reactive group having an oxygen atom, and a photo-acid generator, wherein the proportion of the fluorinated polymer is from 11 to 89 mass % in 100 mass % of the curable composition for imprinting.


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