The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 18, 2023

Filed:

Sep. 02, 2020
Applicant:

Suss Microoptics SA, Hauterive, CH;

Inventors:

Isabel Agireen, Garching, DE;

Katrin Schindler, Garching, DE;

Wilfried Noell, Garching, DE;

Sophiane Tournois, Garching, DE;

Susanne Westenhoefer, Garching, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01M 11/02 (2006.01); G01B 11/14 (2006.01); G01B 11/24 (2006.01); G01N 21/896 (2006.01); G01N 21/958 (2006.01);
U.S. Cl.
CPC ...
G01M 11/0278 (2013.01); G01B 11/14 (2013.01); G01B 11/24 (2013.01); G01M 11/0221 (2013.01); G01M 11/0257 (2013.01); G01N 21/896 (2013.01); G01N 2021/9583 (2013.01);
Abstract

A method for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit is disclosed. The method comprises the following steps: At least a predefined portion of the optical projection unit is illuminated so that an image is generated by at least two channels of the predefined portion of the multi-channel optical projection unit. At least one characteristic quantity is determined based on the analysis of the image, wherein a value of the characteristic quantity is associated with a characteristic feature of the projection unit, a defect of the projection unit and/or a defect class of the projection unit. The quality of the projection unit is assessed based on the at least one characteristic quantity. Moreover, a test system for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit and a computer program are disclosed.


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