The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2023
Filed:
Aug. 13, 2020
Applicant:
Vacuumschmelze Gmbh & Co. KG, Hanau, DE;
Inventors:
Christian Polak, Blackenbach, DE;
Thomas Strache, Frankfurt, DE;
Assignee:
VACUUMSCHMELZE GMBH & CO. KG, Hanau, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 17/00 (2006.01); C23F 1/02 (2006.01); H01F 1/153 (2006.01); C21D 9/52 (2006.01); C22C 45/00 (2023.01); F16F 1/02 (2006.01); B26B 19/38 (2006.01);
U.S. Cl.
CPC ...
C23F 1/02 (2013.01); B26B 19/384 (2013.01); C21D 9/52 (2013.01); C22C 45/008 (2013.01); C23F 17/00 (2013.01); F16F 1/021 (2013.01); H01F 1/153 (2013.01); C21D 2201/03 (2013.01); F16F 2224/0208 (2013.01); F16F 2226/02 (2013.01); F16F 2226/04 (2013.01); F16F 2238/022 (2013.01); F16F 2238/026 (2013.01);
Abstract
A method for the production of a metal strip is provided. The method includes providing an amorphous metal strip having a first main surface and a second, opposing main surface. The first and/or the second main surface are treated with a wet-chemical etching process and/or a photochemical etching process.