The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2023
Filed:
Jul. 01, 2019
Ethicon, Inc., Somerville, NJ (US);
Sasa Andjelic, Nanuet, NY (US);
Ethicon, Inc., Raritan, NJ (US);
Abstract
The present invention is directed to devices and methods for monitoring the purity of monomers, adjusting the polymerization conditions, and consequently improving a polymerization reaction process. In one method, monomer purity is estimated using an on-line evaluation by raising the temperature of the monomer formulation having a defined melting point to a first elevated temperature at least 20° C. above a preset melting point for a selected monomer formulation; cooling the monomer formulation at a controlled cooling rate in the range from about 0.5 to 50° C. per minute; measuring at least one critical property selected from the group consisting of a) crystallization peak temperature at the onset of crystallization, b) an area under the crystallization peak, which represents the heat or enthalpy of crystallization, ΔHc and combinations thereof, comparing the at least one of the selected critical properties measures relative to such properties for standard setting monomer formulations.