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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11628660 B1

PDFFull Text
Date of Patent:
Apr. 18, 2023

Filed:

Feb. 17, 2021

Mechanical-metamaterial-based stretchable substrate with negative poisson's ratio and manufacturing method thereof

Applicant:

Korea Institute of Science and Technology, Seoul, KR;

Inventors:

Phillip Lee, Seoul, KR;

Seungjun Chung, Seoul, KR;

Jeong Gon Son, Seoul, KR;

Jai Kyeong Kim, Seoul, KR;

Heesuk Kim, Seoul, KR;

Suk Joon Hwang, Seoul, KR;

Byung Soo Kang, Seoul, KR;

Assignee:

Korea Institute of Science and Technology, Seoul, KR;

Attorney:

Studebaker & Brackett PC

Primary Examiner:

John L Goff, Ii

Int. Cl.
CPC ...
B32B 37/12 (2006.01); B32B 7/022 (2019.01); B32B 38/08 (2006.01); B32B 38/00 (2006.01); H05K 1/02 (2006.01); H05K 1/03 (2006.01);
U.S. Cl.
CPC ...
B32B 37/12 (2013.01); B32B 7/022 (2019.01); B32B 38/08 (2013.01); B32B 38/145 (2013.01); H05K 1/0283 (2013.01); H05K 1/03 (2013.01); B32B 2038/0076 (2013.01); B32B 2305/02 (2013.01); B32B 2307/51 (2013.01); B32B 2319/00 (2013.01); B32B 2457/20 (2013.01);
Abstract

Disclosed is a method of manufacturing a stretchable substrate according to various embodiments of the present disclosure for realizing the above-described objectives. The method may include generating an auxetic including a plurality of unit structures and adhering one or more elastic sheets to one surface of the auxetic.

Find Patent Forward Citations

Lee, Phillip. (2023). Mechanical-metamaterial-based stretchable substrate with negative poisson's ratio and manufacturing method thereof (U.S. Patent No. 11628660). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11628660

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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