The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2023
Filed:
Sep. 26, 2019
Applicant:
Skc Solmics Co., Ltd., Pyeongtaek-si, KR;
Inventors:
Jaein Ahn, Seongnam-si, KR;
Jang Won Seo, Suwon-si, KR;
Jong Wook Yun, Suwon-si, KR;
Sunghoon Yun, Seongnam-si, KR;
Hye Young Heo, Yongin-si, KR;
Su Young Moon, Anyang-si, KR;
Assignee:
SKC SOLMICS CO., LTD., Pyeongtaek-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/24 (2012.01); C08G 18/50 (2006.01); C08G 18/38 (2006.01); C08G 18/62 (2006.01); C08G 18/10 (2006.01); H01L 21/321 (2006.01); B24B 37/22 (2012.01); C08L 75/04 (2006.01); C08G 101/00 (2006.01);
U.S. Cl.
CPC ...
B24B 37/24 (2013.01); B24B 37/22 (2013.01); C08G 18/10 (2013.01); C08G 18/3812 (2013.01); C08G 18/5015 (2013.01); C08G 18/6279 (2013.01); C08L 75/04 (2013.01); H01L 21/3212 (2013.01); C08G 2101/00 (2013.01);
Abstract
A polishing pad includes a polyurethane, wherein the polyurethane includes a fluorinated repeating unit represented by Formula 1, wherein the number of defects on a substrate after polishing with the polishing pad and a fumed silica slurry is 40 or less;