The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 2023

Filed:

May. 29, 2020
Applicant:

Emc Ip Holding Company Llc, Hopkinton, MA (US);

Inventors:

Eduardo Vera Sousa, Niteroi, BR;

Edward José Pacheco Condori, Rio de Janeiro, BR;

Tiago Salviano Calmon, Rio de Janeiro, BR;

Vinícius Michel Gottin, Rio de Janeiro, BR;

Assignee:

EMC IP Holding Company LLC, Hopkinton, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 9/50 (2006.01); G06F 9/54 (2006.01);
U.S. Cl.
CPC ...
G06F 9/5083 (2013.01); G06F 9/547 (2013.01);
Abstract

Techniques are provided for assigning workloads in a multi-node processing environment using resource allocation feedback from each node. One method comprises obtaining feedback from distributed nodes that process workloads, wherein the feedback for a given node indicates (i) an allocation of resources, and (ii) a number of executing workloads. In response to receiving a given workload to be processed, candidate nodes are identified to execute the given workload; and the given workload is assigned to a given candidate node based on an amount of available resources on each candidate node and/or a stability of resource adjustments made for each candidate node. The stability of the resource adjustments made for each candidate node can be evaluated based on a maximum resource adjustment made for a given candidate node relative to a maximum resource adjustment made for each of the candidate nodes.


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