The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 2023

Filed:

Feb. 26, 2018
Applicant:

Hitachi High-technologies Corporation, Tokyo, JP;

Inventors:

Tooru Inaba, Tokyo, JP;

Takamichi Mori, Tokyo, JP;

Tetsuji Kawahara, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 35/10 (2006.01); G01N 35/00 (2006.01);
U.S. Cl.
CPC ...
G01N 35/1011 (2013.01); G01N 35/00613 (2013.01); G01N 35/1002 (2013.01); G01N 2035/0097 (2013.01);
Abstract

When the automatic analyzer is installed in an environment with a high altitude and different external atmospheric pressures, there is a problem that an amount of vacuum suction decreases due to a decrease in suction performance of a vacuum pump and it is difficult to perform vacuum suction of an analyzed reaction liquid. In view of the above, by newly providing a pressure adjustment mechanism within a flow path connecting a vacuum tank to vacuum pump, it possible to control the pressure difference between a pressure in the vacuum tank and an external atmospheric pressure where the analyzer is installed to be constant regardless of the installation environment. Additionally, by providing a hole in communication with the outside in the vacuum tank or a vacuum bin, it possible to control the pressure difference between the pressure in the vacuum tank and the external atmospheric pressure where the analyzer is installed to be constant regardless of the installation environment.


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