The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2023
Filed:
Mar. 15, 2021
Shofu Inc., Kyoto, JP;
Kenzo Yamamoto, Kyoto, JP;
Hiroyuki Kobayashi, Kyoto, JP;
Daisuke Hara, Kyoto, JP;
Shunsuke Miyata, Kyoto, JP;
SHOFU INC., Kyoto, JP;
Abstract
[Problem] To provide a photocurable composition having a high curing depth. [Solution] To provide a photocurable composition of the present disclosure comprises (A) polymerizable monomer, (B) photosensitizer, (C) photoacid generator, and (D) photopolymerization accelerator, wherein, the photocurable composition comprises (D-1) amine compound represented by formula (1) as the (D) photopolymerization accelerator. (In the formula (1), Ris a substituent represented by formula (2), and Rand Rare substituents represented by formula (2) or substituents selected from —OH group, —O— group, —S— group, —NH—C(O)—NH— group, —C(O)—O— group, —OC(O)— group, —OC(O)—NH— group, —NH—C(O)—O— group, halogen, an organic group which may have an alkoxysilyl group, an aromatic ring which may have a substituent and an alicyclic heterocycle which may have a substituent. Further, Rand Rmay be H when at least one or more Rs of the formula (2) are an aromatic ring, and Rmay be H when Ris a substituent represented by the formula (2)).