The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2023

Filed:

Jul. 12, 2019
Applicant:

Hypertherm, Inc., Hanover, NH (US);

Inventors:

Sung Je Kim, Santa Clara, CA (US);

Jesse A. Roberts, Cornish, NH (US);

Shreyansh Patel, Lebanon, NH (US);

Assignee:

Hypertherm, Inc., Hanover, NH (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05H 1/28 (2006.01); H05H 1/34 (2006.01);
U.S. Cl.
CPC ...
H05H 1/28 (2013.01); H05H 1/34 (2013.01); H05H 1/3468 (2021.05); H05H 1/3478 (2021.05); H05H 1/3489 (2021.05); H05H 2245/60 (2021.05);
Abstract

In some aspects, electrodes can include a front portion shaped to matingly engage a nozzle of the plasma cutting system, the front portion having a first end comprising a plasma arc emitter disposed therein; and a rear portion thermally connected to a second end of the front portion, the rear portion shaped to slidingly engage with a complementary swirl ring of the plasma cutting system and including: an annular mating feature extending radially from a proximal end of the rear portion of the electrode to define a first annular width to interface with the swirl ring, the annular mating feature comprising a sealing member configured to form a dynamic seal with the swirl ring to inhibit a flow of a gas from a forward side of the annular mating feature to a rearward side of the annular mating feature.


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