The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2023

Filed:

Jun. 22, 2021
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventors:

Kazuya Konishi, Tokyo, JP;

Tetsuya Nitta, Tokyo, JP;

Tomohiro Tamaki, Tokyo, JP;

Shinya Soneda, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 27/06 (2006.01); H01L 29/10 (2006.01); H01L 29/16 (2006.01); H01L 29/20 (2006.01); H01L 21/761 (2006.01); H01L 29/78 (2006.01); H01L 21/265 (2006.01); H01L 21/76 (2006.01); H01L 29/739 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0634 (2013.01); H01L 21/26513 (2013.01); H01L 21/26546 (2013.01); H01L 21/761 (2013.01); H01L 21/7602 (2013.01); H01L 21/7605 (2013.01); H01L 27/0664 (2013.01); H01L 29/1095 (2013.01); H01L 29/1602 (2013.01); H01L 29/1608 (2013.01); H01L 29/2003 (2013.01); H01L 29/7397 (2013.01); H01L 29/7813 (2013.01);
Abstract

According to one aspect of the present disclosure, a semiconductor device includes a substrate; a drift layer of a first conductivity type provided on the substrate; a base layer of a second conductivity type provided above the drift layer on the substrate; a source layer of the first conductivity type provided on an upper surface side of the base layer; a first electrode electrically connected to the source layer; a second electrode provided on the rear surface of the substrate; a gate electrode; a trench gate extending from an upper surface of the substrate to the drift layer; and a first bottom layer of the second conductivity type provided below the trench gate in the drift layer, wherein a first distance between a portion of the first bottom layer where an impurity concentration peaks in a thickness direction and the trench gate is larger than 1 μm.


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