The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2023

Filed:

Nov. 04, 2020
Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Sang Hyung Lim, Cheonan-si, KR;

Jee Hoon Kim, Cheonan-si, KR;

Mi Hyang Sheen, Asan-si, KR;

Jin Ho Jang, Cheonan-si, KR;

Myeong Kyu Park, Suwon-si, KR;

Na Ri Ahn, Seongnam-si, KR;

Hui Won Yang, Seoul, KR;

Doo Hyoung Lee, Suwon-si, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/32 (2006.01); H01L 51/52 (2006.01);
U.S. Cl.
CPC ...
H01L 27/3276 (2013.01); H01L 27/322 (2013.01); H01L 27/3223 (2013.01); H01L 27/3272 (2013.01); H01L 51/5284 (2013.01); H01L 2251/5315 (2013.01);
Abstract

A display device includes a first conductive pattern on a substrate, a first insulating layer on the first conductive pattern, a semiconductor pattern on the first insulating layer, a second insulating layer on the first insulating layer and the semiconductor pattern, and a second conductive pattern on the second insulating layer. A first edge of the first conductive pattern faces a second edge of the second conductive pattern, the first conductive pattern does not overlap the second conductive pattern in an area where the first edge faces the second edge, the semiconductor pattern is in the area where the first edge faces the second edge, the second conductive pattern overlaps the second insulating layer, and the second insulating layer includes a third edge protruding from the second edge of the second conductive pattern.


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