The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2023

Filed:

Oct. 12, 2021
Applicants:

Hefei Boe Display Technology Co., Ltd., Anhui, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Zexu Liu, Beijing, CN;

Jincheng Gao, Beijing, CN;

Tao Zhu, Beijing, CN;

Zhiqiang Hu, Beijing, CN;

Qi Liu, Beijing, CN;

Lixing Zhao, Beijing, CN;

Liang Chen, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); G02F 1/1335 (2006.01); G02F 1/1362 (2006.01); G02F 1/1343 (2006.01); G02F 1/1368 (2006.01);
U.S. Cl.
CPC ...
H01L 27/124 (2013.01); G02F 1/1368 (2013.01); G02F 1/133512 (2013.01); G02F 1/134309 (2013.01); G02F 1/136286 (2013.01); H01L 27/1288 (2013.01);
Abstract

A display substrate includes a base substrate; a gate metal pattern including a gate electrode of a thin film transistor and gate lines; a source-drain metal pattern including a source electrode and a drain electrode of the thin film transistor, and data lines, where the gate line cross the data line, to define a plurality of pixel regions arranged in an array form; and a first transparent metal pattern including a common electrode pattern. A minimum distance between each gate line and common electrode patterns in a row of pixel regions located in a same row as the gate line in a first direction is a first spacing, a minimum distance between the gate line and common electrode patterns in the other row of pixel regions adjacent to the gate line in the first direction is a second spacing, and the first spacing is greater than the second spacing.


Find Patent Forward Citations

Loading…