The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2023

Filed:

Jan. 29, 2021
Applicant:

Veeva Systems Inc., Pleasanton, CA (US);

Inventors:

Adam Dubrow, New York, NY (US);

Shahdidul Mihal Ahsan, Jersey City, NJ (US);

Asaf Evenhaim, New York, NY (US);

Assignee:

Veeva Systems Inc., Pleasanton, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 16/00 (2019.01); G06F 16/2453 (2019.01); G06F 16/215 (2019.01); G06F 16/2455 (2019.01); G06F 16/242 (2019.01);
U.S. Cl.
CPC ...
G06F 16/24545 (2019.01); G06F 16/215 (2019.01); G06F 16/2425 (2019.01); G06F 16/2455 (2019.01);
Abstract

Systems and methods are provided for managing and accessing data using one or more data cloud servers. An exemplary method includes: receiving from one or more data sources, a first data set; stratifying the first data set into first samples; receiving from second one or more data sources, a second data set; stratifying the second data set into second samples; computing a projection factor for each of the second samples using the first samples; computing projected samples using the projection factor for each of the second samples; receiving from third one or more data sources, a third data set; computing a parameter using the third data set; selecting one or more of the projected samples to form a fourth data set; and performing a computer operation for estimating the data using the fourth data set and the parameter.


Find Patent Forward Citations

Loading…