The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2023

Filed:

Aug. 23, 2021
Applicant:

Amazon Technologies, Inc., Seattle, WA (US);

Inventors:

Vivek Chawda, Albany, CA (US);

Samartha Chandrashekar, Bellevue, WA (US);

Sophia Tsang, Newark, CA (US);

Frederick Lee von Wurden, Redmond, WA (US);

Roland Mesde, Cupertino, CA (US);

Assignee:

Amazon Technologies, Inc., Seattle, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 8/75 (2018.01); G06N 20/00 (2019.01); G06F 8/71 (2018.01);
U.S. Cl.
CPC ...
G06F 8/75 (2013.01); G06F 8/71 (2013.01); G06N 20/00 (2019.01);
Abstract

Techniques are described for automatically identifying monolithic software applications in users' computing environments for software modernization purposes. A monolithic patent application typically refers to a single-tiered application with self-contained functionality designed largely without modularity, although many types of applications can have monolithic characteristics. In many cases, modularity in a software application's design is desirable and thus developers may often seek to decompose monolithic applications into more modular 'microservices' or other subunits when possible. A software modernization system includes a software analysis service that obtains, for one or more software applications undergoing evaluation, a collection of application artifacts, application profiling metrics, and other application profile data. A collection of features is extracted from the application artifacts and metrics and used as input to a ML model trained to determine whether a software application likely is monolithic.


Find Patent Forward Citations

Loading…