The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 28, 2023

Filed:

Mar. 27, 2018
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Christopher S. Olsen, Fremont, CA (US);

Eric Kihara Shono, San Mateo, CA (US);

Lara Hawrylchak, Gilroy, CA (US);

Agus Sofian Tjandra, Milpitas, CA (US);

Chaitanya A. Prasad, Bangalore, IN;

Sairaju Tallavarjula, Santa Clara, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/455 (2006.01); C30B 25/14 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32357 (2013.01); C23C 16/45587 (2013.01); C30B 25/14 (2013.01); H01J 37/3244 (2013.01); H01J 37/32467 (2013.01); H01J 37/32477 (2013.01); H01J 37/32183 (2013.01); H01L 21/67115 (2013.01);
Abstract

Embodiments of the present disclosure generally relate to a process chamber for conformal oxidation of high aspect ratio structures. The process chamber includes a liner assembly located in a first side of a chamber body and two pumping ports located in a substrate support portion adjacent a second side of the chamber body opposite the first side. The liner assembly includes a flow divider to direct fluid flow away from a center of a substrate disposed in a processing region of the process chamber. The liner assembly may be fabricated from quartz minimize interaction with process gases, such as radicals. The liner assembly is designed to reduce flow constriction of the radicals, leading to increased radical concentration and flux. The two pumping ports can be individually controlled to tune the flow of the radicals through the processing region of the process chamber.


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