The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2023
Filed:
Mar. 25, 2020
Applicant:
Topcon Corporation, Tokyo, JP;
Inventors:
Jongsik Kim, Fort Lee, NJ (US);
Bin Cao, Wayne, NJ (US);
Song Mei, Franklin Park, NJ (US);
Kinpui Chan, Ridgewood, NJ (US);
Zhenguo Wang, Ridgewood, NJ (US);
Zaixing Mao, Edgewater, NJ (US);
Assignee:
TOPCON CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01C 1/04 (2006.01); A61B 3/10 (2006.01); A61B 3/113 (2006.01); A61B 3/14 (2006.01); A61B 3/12 (2006.01); G01B 11/06 (2006.01);
U.S. Cl.
CPC ...
G01B 11/0675 (2013.01); A61B 3/101 (2013.01); A61B 3/113 (2013.01); A61B 3/14 (2013.01);
Abstract
An interferometric method of identifying the thickness of an object that is too thin to be resolved by a Fourier transform of the interference signal includes applying a harmonic frequency modulation to an envelope of the interference signal. Where the object is a tear film, this method may be utilized to determine a thickness of the lipid layer of the tear film.