The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2023
Filed:
Jun. 14, 2019
Kunshan Go-visionox Opto-electronics Co., Ltd., Kunshan, CN;
Mingxing Liu, Kunshan, CN;
Xuliang Wang, Kunshan, CN;
Xuan Zhang, Kunshan, CN;
Shuaiyan Gan, Kunshan, CN;
Feng Gao, Kunshan, CN;
KUNSHAN GO-VISIONOX OPTO-ELECTRONICS CO., LTD., Kunshan, CN;
Abstract
The mask includes an evaporation surface and a glass surface facing away from the evaporation surface. The mask is provided with a plurality of evaporation holes distributed in an array. The evaporation hole penetrates the evaporation surface and the glass surface, and the evaporation hole includes a first opening on the evaporation surface and a second opening on the glass surface. An orthographic projection of the first opening on the glass surface is a first projection opening, and the first projection opening covers the second opening. An interval between the first projection opening and the second opening in a first direction of tensioning the mask is a first interval. An interval between the first projection opening and the second opening in a second direction perpendicular to the first direction is a second interval. The second interval is less than the first interval.