The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 28, 2023

Filed:

Dec. 27, 2018
Applicant:

Jgc Catalysts and Chemicals Ltd., Kanagawa, JP;

Inventors:

Miki Egami, Kitakyushu, JP;

Masanobu Taniguchi, Kitakyushu, JP;

Mitsuaki Kumazawa, Kitakyushu, JP;

Ryo Muraguchi, Kitakyushu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 3/14 (2006.01); C01B 33/18 (2006.01); B24B 37/04 (2012.01); H01L 21/321 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
C09K 3/1409 (2013.01); B24B 37/042 (2013.01); C01B 33/18 (2013.01); C01P 2004/62 (2013.01); C01P 2004/64 (2013.01); H01L 21/3212 (2013.01); H01L 21/7684 (2013.01);
Abstract

There is provided a production method of a chain silica particle dispersion. This production method includes a dispersion preparation step of hydrolyzing alkoxysilane in the presence of ammonia to prepare a silica particle dispersion, an ammonia removal step of removing the ammonia from the silica particle dispersion such that an ammonia amount relative to silica contained in the silica particle dispersion is 0.3% by mass or less, and a hydrothermal treatment step of hydrothermally treating the silica particle dispersion having a silica concentration of 12% by mass or more, from which the ammonia has been removed, at a temperature of not lower than 150° C. and lower than 250° C. An abrasive including such chain silica particles is high in polishing rate and excellent in polishing properties.


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