The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2023
Filed:
Nov. 07, 2018
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Eung Chang Lee, Daejeon, KR;
Mi Sook Lee, Daejeon, KR;
Se Jin Ku, Daejeon, KR;
Na Na Kang, Daejeon, KR;
Hyung Ju Ryu, Daejeon, KR;
Sung Soo Yoon, Daejeon, KR;
No Jin Park, Daejeon, KR;
Je Gwon Lee, Daejeon, KR;
Eun Young Choi, Daejeon, KR;
Yoon Hyung Hur, Daejeon, KR;
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
C08F 293/00 (2006.01); C08F 214/18 (2006.01); C08L 53/00 (2006.01); B32B 27/00 (2006.01); C07C 65/28 (2006.01); C08F 212/14 (2006.01);
U.S. Cl.
CPC ...
C08F 293/005 (2013.01); B32B 27/00 (2013.01); C07C 65/28 (2013.01); C08F 212/20 (2020.02); C08F 214/186 (2013.01); C08L 53/00 (2013.01); B32B 2270/00 (2013.01); C08F 2438/03 (2013.01);
Abstract
Methods for forming a laminate are provided. The method provides a highly aligned block copolymer without orientation defects, coordination number defects distance defects and the like on a substrate, thereby providing a laminate which can be effectively applied to the production of various patterned substrates, and a method for producing a patterned substrate using the same.