The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2023
Filed:
Apr. 27, 2021
Applicant:
Dowa Thermotech Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
DOWA THERMOTECH CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 21/06 (2006.01); B23B 27/14 (2006.01); C23C 16/34 (2006.01); C23C 16/50 (2006.01); C23C 16/52 (2006.01); C23C 16/36 (2006.01); C22C 38/24 (2006.01); C22C 38/46 (2006.01); C23C 14/06 (2006.01); C23C 16/505 (2006.01);
U.S. Cl.
CPC ...
C01B 21/0617 (2013.01); B23B 27/148 (2013.01); C22C 38/24 (2013.01); C22C 38/46 (2013.01); C23C 14/0647 (2013.01); C23C 14/0652 (2013.01); C23C 16/34 (2013.01); C23C 16/347 (2013.01); C23C 16/36 (2013.01); C23C 16/50 (2013.01); C23C 16/52 (2013.01); B23B 2228/105 (2013.01); C01P 2002/54 (2013.01); C07C 2523/22 (2013.01); C07C 2527/198 (2013.01); C23C 16/505 (2013.01);
Abstract
In a vanadium nitride film formed on a surface of a base material, a ratio V [at %]/N [at %] between a vanadium element concentration and a nitrogen element concentration in the film is 1.08 or more and a chlorine element concentration in the film is 1 at % or more and 5 at % or less.