The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 28, 2023

Filed:

Apr. 01, 2011
Applicants:

Olga V. Makarova, Potomac, MD (US);

Cha-mei Tang, Potomac, MD (US);

Platte T Amstutz, Potomac, MD (US);

Inventors:

Olga V. Makarova, Potomac, MD (US);

Cha-Mei Tang, Potomac, MD (US);

Platte T Amstutz, Potomac, MD (US);

Assignee:

CREATV MICROTECH, INC., Potomac, MD (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 1/40 (2006.01); G01N 33/50 (2006.01); B01L 3/00 (2006.01); B01D 29/00 (2006.01); B01D 39/16 (2006.01); B01D 71/46 (2006.01); B01L 9/00 (2006.01); B41F 33/00 (2006.01); B31B 50/00 (2017.01); B31B 100/00 (2017.01); B31B 50/88 (2017.01);
U.S. Cl.
CPC ...
B41F 33/0081 (2013.01); B01D 29/00 (2013.01); B01D 39/16 (2013.01); B01D 39/1692 (2013.01); B01D 71/46 (2013.01); B01L 3/50 (2013.01); B01L 3/5635 (2013.01); B01L 9/00 (2013.01); B41F 33/0036 (2013.01); G01N 1/4005 (2013.01); G01N 1/4077 (2013.01); G01N 33/5005 (2013.01); B01D 2239/0421 (2013.01); B01D 2239/10 (2013.01); B01L 3/502 (2013.01); B01L 2300/0681 (2013.01); B31B 50/006 (2017.08); B31B 50/88 (2017.08); B31B 2100/0022 (2017.08); G01N 2001/4088 (2013.01); Y10T 29/49826 (2015.01); Y10T 29/49963 (2015.01);
Abstract

A microfilter comprising a polymer layer formed from epoxy-based photo-definable dry film, and a plurality of apertures each extending through the polymer layer. A method of forming a microfilter is also disclosed. The method includes providing a first layer of epoxy-based photo-definable dry film disposed on a substrate, exposing the first layer to energy through a mask to form a pattern, defined by the mask, in the first layer of dry film, forming, from the exposed first layer of dry film, a polymer layer having a plurality of apertures extending therethrough, the plurality of apertures having a distribution defined by the pattern, and removing the polymer layer from the substrate.


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