The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2023
Filed:
Jan. 15, 2020
Applicant:
Kkt Holdings Syndicate, Dover, DE (US);
Inventors:
Tzu-Yi Kuo, Taipei, TW;
Yu-Kuang Tseng, Taipei, TW;
Assignee:
KKT HOLDINGS SYNDICATE, Dover, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2006.01); H01J 37/141 (2006.01); G03F 1/20 (2012.01); H01J 37/30 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3175 (2013.01); G03F 1/20 (2013.01); H01J 37/141 (2013.01); H01J 37/3007 (2013.01); H01J 2237/032 (2013.01); H01J 2237/04928 (2013.01);
Abstract
A collimated electron beam is illuminated to a grounded metal mask such that patterns on the mask can be transferred to a substrate identically. In a preferred embodiment, a linear electron source can be provided for enhancing lithographic throughput. The metal mask is adjacent to the substrate, but does not contact with substrate.