The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 21, 2023

Filed:

Dec. 19, 2018
Applicant:

Hkc Corporation Limited, Guangdong, CN;

Inventor:

Huailiang He, Guangdong, CN;

Assignee:

HKC CORPORATION LIMITED, Guangdong, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 11/10 (2006.01); G03F 7/16 (2006.01); B01D 36/00 (2006.01); B01F 23/43 (2022.01); B01F 27/05 (2022.01); B01F 35/00 (2022.01);
U.S. Cl.
CPC ...
G03F 7/16 (2013.01); B01F 23/43 (2022.01); B01F 27/05 (2022.01); B01F 35/187 (2022.01);
Abstract

The present disclosure provides a filter device and a photoresist coating system, and the filter device includes: a liquid storage tank, configured to hold photoresist to be filtered; a stirring structure, including a stirring tank and a stirring assembly at least partially received in the stirring tank; a first pipeline, one end of the first pipeline communicates with the liquid storage tank, and the other end of the first pipeline communicates with the stirring tank; a first filter assembly, provided on the first pipeline and located between the liquid storage tank and the stirring tank; a first pressure detection assembly, provided on the first pipeline and configured to detect a pressure of the photoresist in the first pipeline; and a second pipeline, one end of the second pipeline communicates with the stirring tank, and the other end of the second pipeline communicates with the coating device.


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