The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 21, 2023

Filed:

Aug. 20, 2020
Applicants:

Tobacco Research Institute of Chinese Academy of Agricultural Sciences, Qingdao, CN;

Sichuan Branch of China Tobacco, Chengdu, CN;

Liangshan Branch of Sichuan Tobacco, Xichang, CN;

Inventors:

Jinguang Yang, Qingdao, CN;

Fenglong Wang, Qingdao, CN;

Xiang Xu, Qingdao, CN;

Ying Li, Qingdao, CN;

Liyun Song, Qingdao, CN;

Lili Shen, Qingdao, CN;

Qiang Lei, Chengdu, CN;

Changchun Feng, Chengdu, CN;

Bin Li, Chengdu, CN;

Yong Wang, Xichang, CN;

Dongyang Liu, Xichang, CN;

Lianqiang Jiang, Xichang, CN;

Attorney:
Int. Cl.
CPC ...
C12N 15/11 (2006.01); C12N 15/113 (2010.01); A01N 25/04 (2006.01); A01N 57/16 (2006.01); A01N 63/60 (2020.01);
U.S. Cl.
CPC ...
C12N 15/1131 (2013.01); A01N 25/04 (2013.01); A01N 57/16 (2013.01); A01N 63/60 (2020.01); C12N 15/113 (2013.01); C12N 2310/14 (2013.01); C12N 2310/141 (2013.01); C12N 2320/32 (2013.01);
Abstract

The invention belongs to the field of genetic engineering technology and application thereof, and in order to solve the problems of lack of high efficient TMV-resistant RNAi nano-preparation at present, complicated preparation process of medicament, poor stability and delivery efficiency of dsRNA, the invention provides an RNAi nano-preparation, preparation method thereof and application thereof in TMV prevention and control. The RNAi nano-preparation is prepared from dsRNA and chitosan nano materials, wherein, dsRNA is a highly TMV-resistant RdRP3 gene with a length of 313 bp obtained from screening, with nucleotide sequence shown in SEQ ID NO.1, and the volume ratio of the chitosan to 1 μg/μl dsRNA is 10:(1-6). The RNAi nano-preparation provided by the invention has the advantages of stronger stability and better durability of dsRNA, good biocompatibility, good biodegradability, no harm to crops, environmental friendliness and the like, and has a good application prospect in the field of TMV virus prevention and control.


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