The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2023
Filed:
Feb. 20, 2020
Applicant:
Kioxia Corporation, Tokyo, JP;
Inventors:
Jiahong Wu, Yokkaichi Mie, JP;
Yuji Yamada, Kuwana Mie, JP;
Assignee:
KIOXIA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/40 (2014.01); H01J 49/04 (2006.01); G01B 11/06 (2006.01); G01B 17/02 (2006.01); H01J 49/10 (2006.01); G01N 1/44 (2006.01); G01B 7/06 (2006.01); G01N 1/04 (2006.01);
U.S. Cl.
CPC ...
B23K 26/40 (2013.01); G01B 7/105 (2013.01); G01B 11/0675 (2013.01); G01B 17/025 (2013.01); H01J 49/0463 (2013.01); G01N 1/44 (2013.01); G01N 2001/045 (2013.01); H01J 49/105 (2013.01);
Abstract
According to one embodiment, an analysis apparatus includes a stage on which to place a sample, a light source, a film thickness measurement unit, and a controller. The light source generates a laser beam to irradiate the sample with the laser beam to cause vaporization of the sample. The film thickness measurer measures a thickness of the sample at a first position where the laser beam irradiates the sample. The controller controls at least one irradiation condition of the laser beam based on the measured thickness of the sample.