The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2023
Filed:
Sep. 30, 2020
Applicant:
Gentex Corporation, Zeeland, MI (US);
Inventors:
Joshua D. Lintz, Allendale, MI (US);
Adam R. Heintzelman, Grand Rapids, MI (US);
Joseph A. DeGroot, Hamilton, MI (US);
Assignee:
GENTEX CORPORATION, Zeeland, MI (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/20 (2006.01); G06F 21/32 (2013.01); G02B 3/00 (2006.01); B60R 25/25 (2013.01); G06V 40/19 (2022.01); G06V 10/141 (2022.01); G06V 40/60 (2022.01); G06F 18/22 (2023.01);
U.S. Cl.
CPC ...
G06F 21/32 (2013.01); B60R 25/255 (2013.01); G02B 3/00 (2013.01); G06F 18/22 (2023.01); G06V 10/141 (2022.01); G06V 40/19 (2022.01); G06V 40/67 (2022.01); G02B 2003/0093 (2013.01);
Abstract
An alignment system may comprise a housing defining a channel having a first end and a second end; a light source disposed at the first end of the channel; and an alignment image disposed at the second end of the channel. The light source may be in optical communication with the alignment image. The alignment system may further comprise a baffle extending around at least a portion of an inner perimeter of the channel, the baffle defining a backlight aperture. The light source may be in selective optical communication with the alignment image.