The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 2023

Filed:

Aug. 31, 2020
Applicant:

Best Medical Canada Ltd., Ottawa, CA;

Inventors:

Behzad Yadegari, Ottawa, CA;

Steven McGarry, Ottawa, CA;

Langis Roy, Whitby, CA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01T 1/02 (2006.01); H01L 27/146 (2006.01); H01L 29/788 (2006.01); H01L 29/423 (2006.01); H01L 31/119 (2006.01);
U.S. Cl.
CPC ...
G01T 1/026 (2013.01); H01L 27/14659 (2013.01); H01L 29/42324 (2013.01); H01L 29/788 (2013.01); H01L 31/119 (2013.01);
Abstract

Low-power, dual sensitivity thin oxide FG-MOSFET sensors in RF-CMOS technology for a wireless X-ray dosimeter chip, methods for radiation measurement and for charging and discharging the sensors are described. The FG-MOSFET sensor from a 0.13 μm (RF-CMOS process, includes a thin oxide layer having a device region, a source and a drain associated with the device well region, separated by a channel region, a floating gate extending over the channel region, and a floating gate extension extending over the thin oxide layer adjacent to the device well region. In a matched sensor pair for dual sensitivity radiation measurement, the floating gate and the floating gate extension of a FG-MOSFET higher sensitivity sensor are without a salicide layer or a silicide layer formed thereon and the floating gate and the floating gate extension of a FG-MOSFET lower sensitivity sensor have a salicide layer or a silicide layer formed thereon.


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