The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 2023

Filed:

Mar. 18, 2021
Applicant:

Fujifilm Electronic Materials U.s.a., Inc., N. Kingstown, RI (US);

Inventors:

Abhudaya Mishra, Gilbert, AZ (US);

Carl Ballesteros, San Tan Valley, AZ (US);

Eric Turner, Phoenix, AZ (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 1/02 (2006.01); C11D 7/36 (2006.01); C11D 7/34 (2006.01); H01L 21/02 (2006.01); C11D 7/32 (2006.01); C11D 11/00 (2006.01); C11D 7/26 (2006.01);
U.S. Cl.
CPC ...
C11D 7/36 (2013.01); C11D 7/265 (2013.01); C11D 7/3245 (2013.01); C11D 7/34 (2013.01); C11D 11/0047 (2013.01); H01L 21/02057 (2013.01);
Abstract

The present disclosure relates to cleaning compositions that can be used to clean semiconductor substrates. These cleaning compositions can be used to remove defects arising from previous processing steps on these semiconductor substrates. These cleaning compositions can remove the defects/contaminants from the semiconductor substrates and thereby make the substrates appropriate for further processing. The cleaning compositions described herein primarily contain at least one organic acid and at least one anionic polymer.


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