The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 2023

Filed:

Apr. 22, 2020
Applicant:

Waymo Llc, Mountain View, CA (US);

Inventor:

John T. Simpson, Sahuarita, AZ (US);

Assignee:

Waymo LLC, Mountain View, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); C03C 17/02 (2006.01); C23C 14/10 (2006.01); C23C 14/06 (2006.01); C23C 14/02 (2006.01); C03C 15/00 (2006.01); C03C 17/34 (2006.01); C03C 17/42 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
C03C 17/02 (2013.01); C03C 15/00 (2013.01); C03C 17/3441 (2013.01); C03C 17/42 (2013.01); C23C 14/021 (2013.01); C23C 14/024 (2013.01); C23C 14/0605 (2013.01); C23C 14/10 (2013.01); C23C 14/34 (2013.01); C03C 2217/425 (2013.01); C03C 2217/76 (2013.01); C03C 2218/11 (2013.01); C03C 2218/113 (2013.01); C03C 2218/154 (2013.01); C03C 2218/33 (2013.01);
Abstract

A method for preparing an optically transparent, superomniphobic coating on a substrate, such as an optical substrate, is disclosed. The method includes providing a glass layer disposed on a substrate, the glass layer having a first side adjacent the substrate and an opposed second side, the glass layer comprising 45-85 wt. % silicon oxide in a first glass phase and 10-40 wt. % boron oxide in a second glass phase, such that a glass layer has a composition in a spinodal decomposition region. The method further includes heating the second side of the glass layer to form a phase-separated portion of the layer, the phase-separated portion comprising an interpenetrating network of silicon oxide domains and boron oxide domains, and removing at least a portion of the boron oxide domains from the phase-separated portion to provide a graded layer disposed on the substrate. The graded layer has a first side disposed adjacent the substrate, the first side comprising 45-85 wt. % silicon oxide and 10-40 wt. % boron oxide, and opposite the first side, a porous second side comprising at least 45 wt. % silicon oxide and no more than 5 wt. % boron oxide.


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