The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2023
Filed:
Apr. 18, 2016
Applicant:
Canon Anelva Corporation, Kawasaki, JP;
Inventors:
Hiroshi Yakushiji, Tokyo, JP;
Masahiro Shibamoto, Hachioji, JP;
Assignee:
CANON ANELVA CORPORATION, Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/56 (2006.01); C23C 14/58 (2006.01); H01J 37/32 (2006.01); G11B 5/84 (2006.01); C23C 14/32 (2006.01); C23C 14/06 (2006.01); C23C 14/24 (2006.01);
U.S. Cl.
CPC ...
G11B 5/8408 (2013.01); C23C 14/0605 (2013.01); C23C 14/24 (2013.01); C23C 14/325 (2013.01); C23C 14/566 (2013.01); C23C 14/568 (2013.01); C23C 14/5846 (2013.01); H01J 37/32357 (2013.01);
Abstract
A vacuum process method for a magnetic recording medium having a surface protective layer for protecting a magnetic recording layer formed on a substrate includes a ta-C film forming step of forming a ta-C film on the magnetic recording layer, a transportation step of transporting a substrate on which the ta-C film is formed, a radical generation step of generating radicals by exciting a process gas, and a radical process step of irradiating a surface of the ta-C film with the radicals.