The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2023
Filed:
Dec. 29, 2020
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventors:
Fen Wan, Austin, TX (US);
Weijun Liu, Cedar Park, TX (US);
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/50 (2006.01); B32B 27/30 (2006.01); B32B 27/26 (2006.01); C08F 120/34 (2006.01);
U.S. Cl.
CPC ...
C08F 2/50 (2013.01); B32B 27/26 (2013.01); B32B 27/308 (2013.01); C08F 120/34 (2013.01);
Abstract
A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material can comprise at least one acrylate monomer including at least one cyano group (CN-acrylate monomer). The presence of a low amount of the CN-acrylate monomer between 10 wt % and not greater than 30 wt % can lower the contact angle of the composition and may improve the etch resistance of a photo-cured layer made from the photocurable composition.