The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2023
Filed:
Sep. 18, 2020
Applicant:
Raytheon Technologies Corporation, Farmington, CT (US);
Inventors:
Ying She, Hartford, CT (US);
Rajiv Ranjan, South Windsor, CT (US);
Zissis A. Dardas, Worcester, MA (US);
Gajawalli V. Srinivasan, South Windsor, CT (US);
Lesia V. Protsailo, Bolton, CT (US);
Assignee:
Raytheon Technologies Corporation, Farmington, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/04 (2006.01); C04B 35/80 (2006.01); C23C 16/455 (2006.01); H01L 21/02 (2006.01); C04B 35/628 (2006.01); C04B 35/565 (2006.01); C04B 35/515 (2006.01); C01B 32/956 (2017.01);
U.S. Cl.
CPC ...
C04B 35/80 (2013.01); C04B 35/515 (2013.01); C04B 35/565 (2013.01); C04B 35/62868 (2013.01); C23C 16/045 (2013.01); C23C 16/45544 (2013.01); H01L 21/02529 (2013.01); C01B 32/956 (2017.08); C04B 2235/614 (2013.01);
Abstract
A method for fabricating a component according to an example of the present disclosure includes the steps of depositing a stoichiometric precursor layer onto a preform, and densifying the preform by depositing a matrix material onto the stoichiometric precursor layer. An alternate method and a component are also disclosed.