The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 2023

Filed:

Jan. 05, 2021
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Matthew Goodman, Chandler, AZ (US);

Thomas John Kirschenheiter, Tempe, AZ (US);

Kevin Eugene Quinn, Gilbert, AZ (US);

Assignee:

ASM IP Holding, B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/10 (2006.01); H01L 21/687 (2006.01); H01L 21/02 (2006.01); C23C 16/458 (2006.01); C30B 25/12 (2006.01); C30B 29/06 (2006.01); C23C 16/24 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68735 (2013.01); C23C 16/24 (2013.01); C23C 16/4585 (2013.01); C30B 25/12 (2013.01); C30B 29/06 (2013.01); H01L 21/0262 (2013.01); H01L 21/02532 (2013.01); H01L 21/67115 (2013.01);
Abstract

The present disclosure relates to a susceptor having a generally circular body having a face with a radially inward section and a radially outward section which includes a substrate supporting surface elevated relative to the radially inward section. A sidewall surrounds the substrate supporting surface which upon retention of a substrate on the radially outward section, the sidewall surrounds the substrate. The sidewall includes a plurality of humps which protrude from the top surface of the sidewall. Advantageously, the plurality of humps may aid in even thickness of deposition of material at the edge of the substrate.


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