The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 2023

Filed:

Sep. 24, 2020
Applicant:

Semes Co., Ltd., Chungcheongnam-do, KR;

Inventors:

Youngil Lee, Cheonan-si, KR;

Jungbong Choi, Suwon-si, KR;

Seungho Lee, Cheonan-si, KR;

Gui Su Park, Asan-si, KR;

Gil Hun Song, Cheonan-si, KR;

Seung Hoon Oh, Cheonan-si, KR;

Jonghan Kim, Asan-si, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); H01L 21/67 (2006.01); H01L 21/02 (2006.01); H01L 21/306 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31111 (2013.01); H01L 21/02052 (2013.01); H01L 21/30604 (2013.01); H01L 21/6715 (2013.01); H01L 21/67051 (2013.01); H01L 21/67063 (2013.01); H01L 21/67109 (2013.01); H01L 21/67115 (2013.01); H01L 21/67248 (2013.01); H01L 21/67253 (2013.01); H01L 21/6875 (2013.01);
Abstract

A substrate treating apparatus and a substrate treating method are provided. The substrate treating apparatus includes a support member to support a substrate, a treatment liquid nozzle to supply a treatment liquid to the substrate positioned on the support member, and a controller to control the treatment liquid nozzle such that the treatment liquid supplied to the substrate is differently discharged in a low-flow-supply section and a high-flow-supply section in which an average discharge amount per hour is more than an average discharge amount per hour in the low-flow-supply section.


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