The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 2023

Filed:

Nov. 19, 2018
Applicant:

Oerlikon Surface Solutions Ag, Pfaffikon, Pfaffikon, CH;

Inventor:

Othmar Züger, Triesen, LI;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/35 (2006.01); C23C 14/50 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3452 (2013.01); C23C 14/351 (2013.01); C23C 14/505 (2013.01); H01J 37/3405 (2013.01); H01J 37/347 (2013.01); H01J 37/3423 (2013.01);
Abstract

Magnetron sputtering source () for coating of a substrate (), the sputtering source () comprising: a target () having a target surface at a front side a magnetron arrangement () at a backside of the target () for creating a magnetic field near the target surface, to define a loop shaped erosion zone () at the target surface between an inner magnet assembly () and an outer magnet assembly (), wherein the erosion zone () comprises a middle section with two parallel tracks () having a distance (d) and two curved end loop sections () each of which connects adjoining ends of the parallel tracks () and has a loop width (w) in the direction of the distance (d) which is greater than the distance (d) resulting in a double-T-shaped primary geometry of the erosion zone to provide an increased coating material flux from the end loop sections () to the substrate.


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