The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2023
Filed:
May. 01, 2020
Canon Kabushiki Kaisha, Tokyo, JP;
Manabu Hakko, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
Exposure apparatus includes illumination optical system and projection optical system for forming projected image with light from the illumination optical system. The illumination optical system forms, on pupil plane of the illumination optical system, light emission region including first and second regions. The projected image is composited from images including first image formed by first light from the first region and second image formed by second light from the second region. The first light and/or the second light is broadband light. Increase/decrease change in line width in the second image caused by defocus has different sign with respect to increase/decrease change in line width in the first image caused by defocus, and increase/decrease change in line width in image obtained by compositing the first image and the second image, which is caused by defocus, is decreased.