The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2023
Filed:
May. 22, 2018
Applicants:
Hefei Xinsheng Optoelectronics Technology Co., Ltd., Anhui, CN;
Boe Technology Group Co., Ltd., Beijing, CN;
Inventors:
Wei Li, Beijing, CN;
Guangcai Yuan, Beijing, CN;
Bin Zhou, Beijing, CN;
Dongfang Wang, Beijing, CN;
Jun Cheng, Beijing, CN;
Yingbin Hu, Beijing, CN;
Jingjing Xia, Beijing, CN;
Tongshang Su, Beijing, CN;
Assignees:
Hefei Xinsheng Optoelectronics Technology Co., Ltd., Anhui, CN;
BOE Technology Group Co., Ltd., Beijing, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/021 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/027 (2006.01); H01L 21/027 (2006.01); H01L 21/283 (2006.01); H01L 21/3213 (2006.01); H01L 21/77 (2017.01);
U.S. Cl.
CPC ...
G03F 7/0212 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); H01L 21/0273 (2013.01); H01L 21/283 (2013.01); H01L 21/32134 (2013.01); H01L 21/32139 (2013.01); H01L 2021/775 (2013.01);
Abstract
A photoresist composition and manufacturing method thereof, a manufacturing method of a metal pattern, and a manufacturing method of an array substrate are provided. The photoresist composition includes a base material and an ion adsorbent, and the ion adsorbent is chelating resin.