The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 2023

Filed:

Dec. 08, 2020
Applicant:

Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;

Inventors:

Mathieu Dupoy, Grenoble, FR;

Laurent Frey, Grenoble, FR;

Serge Gidon, Grenoble, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 15/14 (2006.01); G01N 15/00 (2006.01);
U.S. Cl.
CPC ...
G01N 15/14 (2013.01); G01N 2015/0065 (2013.01); G01N 2015/144 (2013.01); G01N 2015/1454 (2013.01); G01N 2015/1493 (2013.01);
Abstract

A device for detecting (D) at least one predetermined particle (P) includes an interferometric element (EI) arranged so as to be illuminated by an incident radiation (L) and comprising at least one so-called thin layer (CM) disposed on top of a so-called substrate layer (Sub), the particle being attached to a surface (Sm) of the thin layer, the interferometric element (EI) forming a Fabry-Pérot cavity with or without attached particle P; a matrix sensor (Det) adapted to detect an image comprising a first portion (P) deriving from the detection of the incident radiation transmitted (L) by the interferometric element alone and a second portion (P) deriving from the detection of the incident radiation transmitted (L) by the interferometric element and any particle (O, P) attached to a surface (Sm) of the thin layer; a processor (UT) linked to the sensor and configured: to calculate, as a function of wavelengths of the incident radiation λi∈[1,m], the variation of intensity of at least one first pixel of the first portion, called first variation (F) and of at least one second pixel of the second portion, called second variation (F), to determine a trend, as a function of the wavelengths of the incident radiation λi∈[1,m], of a phase shift ϕbetween the first variation and the second variation; to detect the attached particle when the phase shift ϕis not constant as a function of the wavelengths of the incident radiation λi∈[1,m].


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