The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 2023

Filed:

Sep. 27, 2018
Applicant:

Corning Incorporated, Corning, NY (US);

Inventors:

Kaveh Adib, Corning, NY (US);

Guangli Hu, Berkeley Heights, NJ (US);

William Joseph Hurley, Corning, NY (US);

Dana Ianson, Westfield, PA (US);

Lin Lin, Painted Post, NY (US);

Santona Pal, Corning, NY (US);

James Joseph Price, Corning, NY (US);

Assignee:

Corning Incorporated, Corning, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 15/04 (2006.01); B32B 17/06 (2006.01); C03C 17/245 (2006.01); C03C 3/091 (2006.01); C03C 3/097 (2006.01); C03C 17/22 (2006.01);
U.S. Cl.
CPC ...
C03C 17/245 (2013.01); C03C 3/091 (2013.01); C03C 3/097 (2013.01); C03C 17/225 (2013.01); C03C 2217/281 (2013.01); C03C 2217/29 (2013.01); C03C 2217/78 (2013.01); C03C 2217/91 (2013.01); C03C 2218/155 (2013.01);
Abstract

An article that includes: a substrate having a glass, glass-ceramic or a ceramic composition and comprising a primary surface; and a protective film disposed on the primary surface. The protective film comprises a thickness of greater than 1.5 microns and a maximum hardness of greater than 15 GPa at a depth of 500 nanometers, as measured on the film disposed on the substrate. Further, the protective film comprises a metal oxynitride that is graded such that an oxygen concentration in the film varies by 1.3 or more atomic %. In addition, the substrate comprises an elastic modulus less than an elastic modulus of the film.


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