The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2023
Filed:
May. 05, 2017
Applicant:
Neutron Therapeutics, Inc., Danvers, MA (US);
Inventors:
Geoffrey Ryding, Manchester, MA (US);
Takao Sakase, Rowley, MA (US);
William H. Park, Marblehead, MA (US);
Theodore H. Smick, Gloucester, MA (US);
Assignee:
Neutron Therapeutics, Inc., Danvers, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61N 5/10 (2006.01); H05H 3/06 (2006.01); G21G 1/10 (2006.01); G21K 1/00 (2006.01); G21K 5/04 (2006.01); G21K 5/08 (2006.01);
U.S. Cl.
CPC ...
H05H 3/06 (2013.01); A61N 5/1077 (2013.01); A61N 5/1078 (2013.01); A61N 5/1079 (2013.01); G21G 1/10 (2013.01); G21K 1/00 (2013.01); G21K 5/04 (2013.01); G21K 5/08 (2013.01); A61N 2005/109 (2013.01); A61N 2005/1087 (2013.01); A61N 2005/1095 (2013.01);
Abstract
The present disclosures relates to an ion beam assembly where a relatively small deflection angle (approximately 15° from the center of the beam line) is used in conjunction with two beam dumps located on either side of the beam. In some embodiments, the combination of the two beam dumps and the magnet assembly can provide an ion beam filter. In some embodiments, the resulting system provides a smaller, safer and more reliable ion beam. In some embodiments, the ion beam can be a proton beam.