The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2023
Filed:
Jul. 19, 2021
Gopro, Inc., San Mateo, CA (US);
Nicolas Bessou, Issy-les-Moulineaux, FR;
Romain Gounelle, Haut de Seine, FR;
GoPro, Inc., San Mateo, CA (US);
Abstract
A method for reducing overexposure or underexposure in a time-lapse includes acquiring, using an image capture device, a first frame of the time-lapse using a first exposure setting; and acquiring, using the image capture device, a second frame of the time-lapse. The first frame of the time-lapse is acquired under a first luminance condition. The second frame of the time-lapse is acquired under a second luminance condition that is different from the first luminance condition. The second frame of the time-lapse is acquired using an exposure setting that is determined based on respective exposure settings of one or more preview images obtained between the first frame of the time-lapse and the second frame of the time-lapse. The one or more preview images are not included in the time-lapse.