The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2023

Filed:

Apr. 23, 2019
Applicant:

Hitachi Automotive Systems, Ltd., Hitachinaka, JP;

Inventors:

Takayuki Oshima, Hitachinaka, JP;

Katsumi Ikegaya, Hitachinaka, JP;

Masato Kita, Hitachinaka, JP;

Keishi Komoriyama, Hitachinaka, JP;

Kiyotaka Kanno, Hitachinaka, JP;

Shinichirou Wada, Tokyo, JP;

Assignee:

HITACHI ASTEMO, LTD., Hitachinaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); B60R 16/023 (2006.01); H01L 27/11575 (2017.01);
U.S. Cl.
CPC ...
H01L 27/1203 (2013.01); B60R 16/0231 (2013.01); H01L 27/11575 (2013.01);
Abstract

Provided are a semiconductor device having small characteristic variations with time and high reliability and an in-vehicle control device using the same, the semiconductor device including a plurality of transistor elements constituting a current mirror circuit or a differential amplifier circuit that requires high relative accuracy. A semiconductor device includes a first metal-oxide-semiconductor (MOS) transistor, a second MOS transistor paired with the first MOS transistor, and insulation separation walls which insulate and separate elements from each other, wherein relative characteristics of the first MOS transistor and the second MOS transistor are in a predetermined range, the first MOS transistor and the second MOS transistor are relatively arranged in a gate width direction or a gate length direction, and distances between gate oxide films of the first MOS transistor and the second MOS transistor and the insulation separation walls facing the gate oxide films are the same as each other in a direction perpendicular to the gate width direction or the gate length direction.


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