The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2023
Filed:
Oct. 17, 2019
International Business Machines Corporation, Armonk, NY (US);
JingChang Huang, Shanghai, CN;
Sheng Nan Zhu, Shanghai, CN;
Fan Li, Shanghai, CN;
Peng Ji, Nanjing, CN;
Jian Xu, Shanghai, CN;
Wei Zhao, Shanghai, CN;
Jinfeng Li, Beijing, CN;
International Business Machines Corporation, Armonk, NY (US);
Abstract
The present invention relates to a method, system and computer program product for defect enhancement. According to the method, a plurality of proposed regions from a plurality of images taken for a display panel is obtained. Each of proposed region of the plurality of proposed regions include a suspected defect on the display panel. At least two proposed regions from the plurality of proposed regions that deserve to be superimposed based on a set of conditions is determined. The at least two proposed regions for acquiring an enhanced defect are superimposed.