The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2023
Filed:
Nov. 20, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Lan Yu, Albany, NY (US);
Benjamin D. Briggs, Cllfton Park, NY (US);
Tyler Sherwood, Fonda, NY (US);
Raghav Sreenivasan, Fremont, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01); G02F 1/1362 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133553 (2013.01); G02F 1/136227 (2013.01); G02F 1/136277 (2013.01);
Abstract
Processing methods may be performed to form a pixel material in a semiconductor substrate. The methods may include forming a lithographic mask overlying the semiconductor substrate. The lithographic mask may include a window. The method may include forming a via in the semiconductor substrate by a dry etch process through the window. The method may also include forming the pixel material by depositing a fill material in the via.